Mask Making Using A Laser Writing System

Robert Gauthier; Jacek Chrostowski; Barry Paton; Michael Cada

doi:10.1117/12.937202

10 March 1987 Mask Making Using A Laser Writing System

Robert Gauthier, Jacek Chrostowski, Barry Paton, Michael Cada

Proceedings Volume 0704, Integrated Optical Circuit Engineering IV; (1987) https://doi.org/10.1117/12.937202
Event: Cambridge Symposium-Fiber/LASE '86, 1986, Cambridge, MA, United States

Abstract

An inexpensive IBM based laser writing system for making masks suitable for integrated optic applications is presented. The high degree of computer control makes this technique easy to use and relatively fast. The system can write lines, circles, arcs and shaded areas generating non-conventional designs and can be interfaced with various C A D programs.

Citation Download Citation

Robert Gauthier, Jacek Chrostowski, Barry Paton, and Michael Cada "Mask Making Using A Laser Writing System", Proc. SPIE 0704, Integrated Optical Circuit Engineering IV, (10 March 1987); https://doi.org/10.1117/12.937202

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