Dark Field Technology - A Practical Approach To Local Alignment

David R. Beaulieu; Paul P. Hellebrekers

doi:10.1117/12.967043

1 January 1987 Dark Field Technology - A Practical Approach To Local Alignment

David R. Beaulieu, Paul P. Hellebrekers

Proceedings Volume 0772, Optical Microlithography VI; (1987) https://doi.org/10.1117/12.967043
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

A fully automated direct reticle reference alignment system for use in step and repeat camera systems is described. The technique, first outlined by Janus S. Wilczynski, ("Optical Step and Repeat Camera with Dark Field Alignment", J. Vac. Technol., 16(6), Nov./Dec. 1979), has been implemented on GCA Corporation's DSW Wafer Stepper®. Results from various process levels covering the typical CMOS process have shown that better than ±0.2μm alignment accuracy can be obtained with minimal process sensitivity. The technique employs fixed illumination and microscope optics to achieve excellent registration stability and maintenance-free operation. Latent image techniques can be exploited for intra-field, grid and focus characterization.

Citation Download Citation

David R. Beaulieu and Paul P. Hellebrekers "Dark Field Technology - A Practical Approach To Local Alignment", Proc. SPIE 0772, Optical Microlithography VI, (1 January 1987); https://doi.org/10.1117/12.967043

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