Bilevel System HPR/PMMA

Andre P. Weill; Elisabeth C. Dechenaux; Patrick J. Paniez; Gilles R. Amblard

doi:10.1117/12.975608

17 September 1987 Bilevel System HPR/PMMA

Andre P. Weill, Elisabeth C. Dechenaux, Patrick J. Paniez, Gilles R. Amblard

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Proceedings Volume 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection; (1987) https://doi.org/10.1117/12.975608
Event: Fourth International Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, The Hague, Netherlands

Abstract

A two layers HPR/PMMA lithographic process is developped in order to overcome the limitations of the single layer scheme when over aluminium steps. Results of PMMA coating and step coverage, HPR patterning, descum of the interfacial layer, image development are presented and discussed in terms of material properties.

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Andre P. Weill, Elisabeth C. Dechenaux, Patrick J. Paniez, and Gilles R. Amblard "Bilevel System HPR/PMMA", Proc. SPIE 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, (17 September 1987); https://doi.org/10.1117/12.975608

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