Paper
1 January 1988 Photolithography Expert Systems At National Semiconductor
Pilla A. Leitner, Robert L. Brown
Author Affiliations +
Abstract
Two expert systems for photolithography are discussed and compared. The systems are found to be beneficial to both engineers and technicians. Important implementation issues are presented.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Pilla A. Leitner and Robert L. Brown "Photolithography Expert Systems At National Semiconductor", Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); https://doi.org/10.1117/12.968377
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CITATIONS
Cited by 1 scholarly publication.
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KEYWORDS
Computing systems

Optical lithography

Human-machine interfaces

Semiconductors

Virtual colonoscopy

Integrated circuits

Diagnostics

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