Paper
11 November 2016 Freeform metrology using subaperture stitching interferometry
Author Affiliations +
Proceedings Volume 10151, Optics and Measurement International Conference 2016; 101510D (2016) https://doi.org/10.1117/12.2257279
Event: Optics and Measurement 2016 International Conference, 2016, Liberec, Czech Republic
Abstract
As applications for freeform optics continue to grow, the need for high-precision metrology is becoming more of a necessity. Currently, coordinate measuring machines (CMM) that implement touch probes or optical probes can measure the widest ranges of shapes of freeform optics, but these measurement solutions often lack sufficient lateral resolution and accuracy. Subaperture stitching interferometry (SSI™) extends traditional Fizeau interferometry to provide accurate, high-resolution measurements of flats, spheres, and aspheres, and development is currently on-going to enable measurements of freeform surfaces. We will present recent freeform metrology results, including repeatability and cross-test data. We will also present MRF® polishing results where the stitched data was used as the input “hitmap” to the deterministic polishing process.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chris Supranowitz, Jean-Pierre Lormeau, Chris Maloney, Paul Murphy, and Paul Dumas "Freeform metrology using subaperture stitching interferometry", Proc. SPIE 10151, Optics and Measurement International Conference 2016, 101510D (11 November 2016); https://doi.org/10.1117/12.2257279
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Cited by 5 scholarly publications.
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KEYWORDS
Computer generated holography

Distortion

Monochromatic aberrations

Metrology

Aspheric lenses

Optical spheres

Freeform optics

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