Paper
14 December 2016 Simulation of internal charge distribution and spatial charge characteristics of ferroelectrics irradiated by focused electron beam
Anna V. Pavelchuk, Anna G. Maslovskaya
Author Affiliations +
Proceedings Volume 10176, Asia-Pacific Conference on Fundamental Problems of Opto- and Microelectronics; 101760P (2016) https://doi.org/10.1117/12.2268165
Event: Asia-Pacific Conference on Fundamental Problems of Opto- and Microelectronics, 2016, Khabarovsk, Russia
Abstract
This article reveals the problem of electron transport as well as charging effect analysis in ferroelectrics subjected to electron beam irradiation at diagnostics with scanning electron microscope (SEM) techniques. The parameters of the electron irradiation doze and source function were estimated by means of 3D-Monte-Carlo simulation of electron trajectories in the solid specimen. The computation data were demonstrated for typical ferroelectrics irradiated by intermediate-energy electron bunches (10-40 keV). The modification of reaction-diffusion model was also presented to evaluate the electron beam-induced charging dynamics in ferroelectrics. The simulation was based on the joint numerical solution of the continuity equation and Poisson equation taking into account the intrinsic radiation-induced diffusion processes. The findings from this study enable demonstrating charge distribution, dynamics of the potential distribution, electric field components and electron beam-induced component of polarization at assigned parameters relative to experimental condition of reversal process of domain structure in electron beam-irradiated ferroelectrics.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anna V. Pavelchuk and Anna G. Maslovskaya "Simulation of internal charge distribution and spatial charge characteristics of ferroelectrics irradiated by focused electron beam", Proc. SPIE 10176, Asia-Pacific Conference on Fundamental Problems of Opto- and Microelectronics, 101760P (14 December 2016); https://doi.org/10.1117/12.2268165
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KEYWORDS
Monte Carlo methods

Electron beams

Electron microscopes

Optical simulations

Scanning electron microscopy

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