Pyrolytic Deposition Of SiO[sub]2[/sub] With CO[sub]2[/sub] Laser

M. D. Fernandez; P. Gonzalez; B. Leon; M. Perez-Amor

doi:10.1117/12.950109

10 April 1989 Pyrolytic Deposition Of SiO₂ With CO₂ Laser

M. D. Fernandez, P. Gonzalez, B. Leon, M. Perez-Amor

Proceedings Volume 1022, Laser Assisted Processing; (1989) https://doi.org/10.1117/12.950109
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

Preliminary results obtained by laser-induced chemical vapor deposition of silicon dioxide films are reported. Films have been deposited on a silicon substrate using a CO2 laser.

Citation Download Citation

M. D. Fernandez, P. Gonzalez, B. Leon, and M. Perez-Amor "Pyrolytic Deposition Of SiO₂ With CO₂ Laser", Proc. SPIE 1022, Laser Assisted Processing, (10 April 1989); https://doi.org/10.1117/12.950109

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