Among the areas of reticle manufacturing which must improve substantially to meet future requirements are: resist optimization, process automation and control, dry etching, feature linearity, submicron feature processing, reticle blanks and process chemistry. Additionally, the reticle manufacturer must identify, analyze, and reduce the component errors of process, equipment and raw materials. This paper will review the evolution of reticle processing through the current state-of-the- art, and will assess the equipment, methodology, and materials required to extend reticle manufacture capabilities to the level required by 256Mb technology. |
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Reticles
Manufacturing
Control systems
Photoresist processing
Process control
Optical lithography
Optics manufacturing