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The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org. The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from this book: Author(s), “Title of Paper,” in Optical Measurement Systems for Industrial Inspection X, edited by Peter Lehmann, Wolfgang Osten, Armando Albertazzi Gonçalves Jr., Proceedings of SPIE Vol. 10329 (SPIE, Bellingham, WA, 2017) Seven-digit Article CID Number. ISSN: 0277-786X ISSN: 1996-756X (electronic) ISBN: 9781510611030 ISBN: 9781510611047 (electronic) Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time)· Fax +1 360 647 1445 Copyright © 2017, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/17/$18.00. Printed in the United States of America. Publication of record for individual papers is online in the SPIE Digital Library.
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AuthorsNumbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc. Ackermann, Philippe, 0H Ahmadi Rashtabadi, H., 3T Aizu, Yoshihisa, 3H Alatawi, Ayshah, 2B Albertazzi, A., 1V Angervaks, A. E., 2Z Aoyama, F., 2U Arai, Y., 1Q Assmann, H., 32 Ayubi, Gastón A., 3W Badcock, Rodney A., 2P Bahloul, Derradji, 0B Bai, Yunbo, 0A Bandari, Yashwanth K., 1Z Bang, Ole, 0I Baricholo, Peter, 2Q Barzen, Lars, 11 Baselt, T., 32 Bauer, J., 3J Baumgart, Marcus, 34 Beckmann, Tobias, 0D, 0F Beder, Christian, 2G Beermann, Rüdiger, 0U, 2T Belashov, A. V., 1W Beloivan, P. A., 3V Beltran-Gonzalez, A., 4P Belzer, Dominik, 0D Benedet, M. E., 1V Berberova, Nataliya, 3Y Bergmann, Ralf B., 1T Bermudez, C., 15 Bermuske, Mike, 1Y Bertz, Alexander, 0D, 0F Bianco, Vittorio, 0E Bichra, Mohamed, 1K Binkele, Tobias, 1S Bischoff, Jörg, 16 Blokhina, Anastasia A., 2K, 4M Bluemich, A., 3J Boden, Fritz, 2J Boettcher, Tobias, 0K Bointon, P., 0W Boisse, Isabelle, 2M Bouamama, Larbi L., 0B Bradu, A., 2D Brand, Uwe, 44 Brandenburg, Albrecht, 2A Bräuer-Burchardt, Christian, 0N Breitbarth, Andreas, 0O Broeg, Christopher, 2M Bronshtein, I. G., 26 Buchta, Zdeněk, 3I Burada, Dali R., 1K Burk, S., 06 Burke, Jan, 0T Burtseva, Anastasiia A., 4T Buse, Karsten, 0D Büttner, Lars, 1Y Cadevall, C., 15 Cao, Zhen, 3N Carl, Daniel, 0D, 0F Chang, Jinyong, 2H Chapalo, Ivan, 45 Charrett, Thomas O. H., 1Z Charsley, Jake M., 0Y, 2M Chehura, Edmon, 25 Chen, Lei, 09, 29 Chertov, Aleksandr N., 46 Chiang, Chih-Wei, 3B Chiang, Hong-Wei, 3B Chou, Huann-Ming, 3B Číp, Ondřej, 3I Cizek, Martin, 43 Coppola, S., 4Q Corn, Stephane, 0P Correns, Martin, 0O Coupland, Jeremy M., 0L Czarske, Jürgen, 1Y, 20, 24 Da, Feipeng, 0V Dai, Yifan, 4S de Groot, Peter, 19 Demian, D., 2D Denisov, Victor M., 2K, 3A Di Marcantonio, P., 0Z Ding, Jialuo, 1Z Disseau, Karen, 0Z, 2M Di Varano, I., 0Z Doan, Van Bac, 2Z Doering, Christoph, 11 Dolon, François, 2M Du, Shaojun, 4E Dubrov, Alexandre V., 42 Dubrov, Vladimir D., 42 Duma, V.-F., 2D Dwivedi, P., 2Y Ehret, Gerd, 1D, 1T Elster, C., 39 Ermolaev, Petr A., 3D Ezhova, Kseniia V., 4T Fabrika, Sergei N., 3R Falldorf, Claas, 1T Fantin, A. V., 1V Fedder, H., 06 Fei, Zixuan, 4U, 4X Feng, Shuanglian, 2H Ferrari, Luca, 4O Ferraro, Pietro, 0E, 4Q Ferreira, Carlos, 4C Feuchter, Thomas, 0I Finizio, Andrea, 0E Fischer, Andreas, 1P Fisser, Maximilian, 2P Fitzgerald, Danette, 19 Fleischmann, Friedrich, 1S, 30 Fortmeier, I., 39 Fouckhardt, Henning, 11 Fratz, Markus, 0D, 0F Frolov, D. N., 3V Fu, Yu, 12 Funamizu, Hideki, 3H Fursenko, O., 3J Gao, Xiao Fei, 4U, 4V Gao, Zhishan, 29 Garbuzov, F. E., 1W García, Javier, 48, 4C Garcia-Torales, G., 4P Genoni, M., 0Z Georges, Marc P., 1M Gisi, Michael, 2R Głomb, Grzegorz, 3P Gollor, Pascal, 40 Gonzalez, O., 0Z Gorbachev, Alexey A., 4F Gorbunova, Elena V., 46 Gorecki, Christophe, 0C Gorschenew, W., 0S Granero, L., 48 Greiffenhagen, Felix, 20 Greiner, A., 32 Grilli, S., 4Q Gritsevich, Maria, 1B, 2S Gronle, Marc, 0K, 14 Grossman, Erich, 17 Guo, Jia Yu, 4V, 4X Guo, Xiaoli, 3O Gurov, Igor, 4I Gürtler, Johannes, 20 Gurylev, O. A., 3E Gusarov, Vadim F., 4J, 4L Gutierrez, Gustavo, 30 Hæggström, Edward, 1B, 2S Hagemann, Jan-Hendrik, 1T Hagemeier, Sebastian, 16 Han, Christopher B., 3K Han, Sen, 3K Hartmann, P., 1I, 2I, 32 Hartmann, Stefan, 1O Haufe, Daniel, 20 Hayasaki, Yoshio, 07 Heinrich, Andreas, 0Q Heinrich, F., 3J Heist, Stefan, 0N Hennelly, Bryan, 2W Henning, Thomas, 1S, 30 Heuck, Hans-Martin, 1F Hilbig, David, 1S, 30 Hoang, Anh Phuong, 4F Hoang, Phong V., 38 Hola, Miroslava, 43 Holz, Philipp, 2A Honne, Atle, 2R Hrabina, Jan, 43 Hsieh, Hung-Lin, 3S, 3Z Hu, Guohang, 3N Hu, Qi, 12 Huang, Y. G., 3Z Huang, Ya, 29 Hucl, Vaclav, 43 Huke, Philipp, 0Y, 0Z, 2M Huntley, Jonathan M., 0G Hunze, Arvid, 2P Hutiu, Gh., 2D Hwang, Chi-Hung, 1A Ienny, Patrick, 0P Inochkin, F. M., 26 Israelsen, Niels M., 0I Ivanov, Branimir, 3Y Ivanov, Nikita, 4I Ivanov, S. A., 2Z Jacobs, P., 2I Jafari, F., 36 James, Stephen W., 25 Jelínek, Michal, 43 Jha, Diwaker, 3X Jin, Rui, 4W Jonker, Wouter, 33 Józwik, Michal, 0C Kara Mohammed, Soumaya, 0B Karasik, Valerii E., 2F Kassamakov, Ivan, 1B, 2S Kästner, Markus, 0S, 0U, 2T Kemao, Qian, 0V Khan, Gufran S., 1K Kim, Giyoung, 3G Kissinger, Thomas, 25 Kleinschmidt, Ann-Kathrin, 11 Kleshchenok, Maksim A., 4L, 4M Klimov, Aleksandr A., 4J Knell, Holger, 1F Koch, E., 32 Koenders, Ludger, 44 Kompan, T. A., 26 Kondratjev, S. V., 26 Kong, Ming, 37 Kong, Xinxin, 05, 2E, 3O Konijnenberg, A. P., 2Y Konyakhin, Igor A., 2V, 38, 3C, 4H Korenev, A. S., 26 Korhonen, Heidi, 0Z, 2M Kornilin, Dmitriy V., 4K Korolev, Timofey K., 3F Korotaev, Valery V., 2K, 3A, 46, 4M Kostencka, Julianna, 0C, 2W Kotov, Oleg, 45 Kowarsch, Robert, 1O Kowzan, Grzegorz, 0Y, 2M Kozacki, Tomasz, 0C, 2W Krauter, Johann, 14 Kroupa, Gerhard, 34 Kruglov, S. K., 26 Kudryavtsev, Ilya A., 4K Kuehnhold, Peter, 40 Kühmstedt, Peter, 0N Kujawińska, Małgorzata, 3X Kuschmierz, Robert, 24 Landoni, M., 0Z Languy, Fabian, 1M Latifi, H., 36 Latyev, Svjatoslav M., 3U, 3V Laubach, Sören, 1D Lawman, Samuel, 0J Lazar, Josef, 43 Lazarev, Vladimir A., 2F Leach, Richard K., 0L, 0W Lecler, Sylvain, 18 Lee, Jiann-Shen, 3B Lee, Ju-Yi, 3S, 3Z Leger, Romain, 0P Lehmann, Peter, 16, 1D, 40 Le Moigne, Nicolas, 0P Lempa, C., 1I Lenzini, Nicola, 4O Leong-Hoï, Audrey, 18 Leonov, Stanislav O., 2F Lešundák, Adam, 3I Li Causi, Gianluca, 0Z Li, Dong, 4W, 4X Li, Huan Huan, 4V, 4X Li, Jia, 28 Li, Renpu, 2V Li, Wei, 37 Li, Xueyuan, 3K Li, Yang, 2E, 3O Li, Yang, 3Q Li, Yu Qin, 4V Li, Zhi, 44 Liang, A. J., 3Z Liang, Rongguang, 37 Liebig, Thomas, 33 Lim, Jongguk, 3G Lin, Zhi Ying, 3S Lindlein, Norbert, 03 Liu, Huan, 12 Liu, Qinggang, 3Q Liu, Shijie, 0A, 3N Liu, Tianhua, 2H Liu, Wenguang, 4E Liżewski, Kamil, 3X Lobanova, Anastasiya Y., 2K Lu, Qi, 0A Lu, Qing, 28 Ludwikowski, Krzysztof, 2J Lushnikov, D. S., 3E Lutz, Christian, 2A Lv, Xiaoyu, 2E, 3O Ma, Jun, 29 Ma, Xiao, 0A Macedo, F. J., 1V Maconi, Göran, 1B, 2S Mai, A., 3J Manske, Eberhard, 16 Mantel, Klaus, 03, 1N Maraev, Anton A., 4J Margaryants, Nikita, 4I Maria, Michael, 0I Mariné, J., 15 Markin, V. V., 3E Marschmeyer, S., 3J Martínez, D., 15 Maslowski, Piotr, 0Y, 2M Mason, E., 0Z Mastylo, Rostyslav, 16 Mat Jafri, Mohd. Zubir, 4D, 4G Mateev, Georgy, 3Y Matilla, A., 15 McCracken, Richard A., 0Y, 2M McMillan, Alison J., 4K Mednikov, Sergey V., 4J Memmolo, Pasquale, 0E Méndez, Alexis, 1X Merkel, Markus, 0Q Michel, Florent, 1Z Micó, Vicente, 48, 4C Mikel, Bretislav, 43 Mikuła, Marta, 0C Millerd, James E., 1G Milton-Garduno, J., 4P Mirzade, Fikret Kh., 42 Mishra, Vinod, 1K Mitrofanov, Sergey S., 3L Mo, Changyeun, 3G Mo, Linhai, 37 Mollabashi, M., 3T Montgomery, Paul C., 18 Mroczka, Janusz, 3P Muinonen, Karri, 1B, 2S Muslimov, Eduard R., 3R Mutter, Kussay Nugamesh, 4D, 4G Nasti, G., 4Q Naumova, Anastasiia I., 3U Nazarova, Dimana, 3Y Neethling, Pieter H., 2Q Nekrylov, Ivan S., 4L, 4M Nelsen, B., 2I, 32 Nercissian, V., 1N Nikonorov, N. V., 2Z Nogin, Anton, 3C Nolvi, Anton, 1B North-Morris, Michael, 1G Notni, Gunther, 0N, 0O, 0R Odinokov, S. B., 3E Okun', R. A., 2Z Oliva, Ernesto, 2M Olivieri, F., 4Q Onodera, Yusei, 3H Origlia, Livia, 2M Osanlou, Ardeshir, 4K Osten, Wolfgang, 04, 0K, 14 Ota, Kazuki, 07 Ottevaere, Heidi, 3X Ottogalli, Sebastien, 2M Pagliarulo, V., 4Q Pant, Kamal K., 1K Pariani, G., 0Z Paturzo, Melania, 0E Patzelt, Stefan, 1P Peng, Xiaoqiang, 4S Penttilä, Antti, 1B, 2S Pepe, Francesco, 2M Pereira, S. F., 2Y Peretyagin, Vladimir S., 3F Perrin, Stéphane, 18 Perruchot, Sandrine, 2M Peschka, Martin, 2G Petrochenko, Andrey, 4H Petzold, U., 1I Pfeiffer, Pierre, 18 Pham, Minh Tuan, 3I Piano, S., 0W Picart, Pascal, 0B Picazo-Bueno, José Ángel, 4C Pikálek, Tomáš, 3I Podoleanu, Adrian, 0I, 2D Pösch, Andreas, 0U, 2T Potemkin, Andrey, 4I Povarov, Kirill S., 3L Pravdová, Lenka, 3I Preissler, Marc, 0R Pruss, Christof, 04 Pukhov, N. F., 26 Pulwer, S., 3J Puranto, Prabowo, 44 Qiang, Xiwen, 2H Qin, Zirui, 3Q Quentin, Lorenz, 0U, 2T Radilov, Andrey V., 3A Ramakrishnan, Karthik Ram, 0P Ranjbar-Naeini, O. R., 36 Ratcliffe, Ian, 4K Razi, S., 3T Reardon, Patrick J., 2B Rebeyre, Pierre, 2R Reichel, S., 1I Reid, Derryck T., 0Y, 2M Reiners, Ansgar, 0Y, 2M Reithmeier, Eduard, 0S, 0U, 2T Rembe, Christian, 1O Repin, Vladislav A., 46 Rerucha, Simon, 43 Riebling, Jörg, 1D Riva, Marco, 0Z, 2M Rohwer, Erich G., 2Q Rosenberger, Maik, 0O, 0R Rothau, Sergej, 03 Rovati, Luigi, 4O Rubio, R., 48 Ruiz, Pablo D., 0G Ryzhova, Victoria A., 2K, 3A Saint-Georges, Philippe, 1M Sakhariyanova, Aiganym M., 2V Samokhvalov, Andrey, 4I Samsonov, A. M., 1W Sanz, M., 48 Sarajlic, Mirsad, 2M Šarbort, Martin, 3I Schäfer, Sebastian, 2M Schambach, Jörg, 0O Schiller, Annelie, 0D Schindler, Johannes, 04 Schmidt, Ingo, 0N Schmitt, Robert, 0H Schrader, S., 3J Schröder, Andreas, 2J Schulz, M., 39 Seah, Hock Soon, 0V Semenov, A. A., 1W Semenova, I. V., 1W Seurig, Roland, 2R Seyler, Tobias, 0F Sguazzo, Carmen, 1O Shakher, Chandra, 1K Shao, Jianda, 0A, 3N Shelygina, Svetlana, 4I Shen, Hua, 28 Shen, Ming-Hsing, 1A Shen, Yao-Chun, 0J Sheridan, John T., 2W Shi, Feng, 4S Shishova, M. V., 3E Sigel, Andre, 0Q Silva, F. A. A., 1V Sims-Waterhouse, D., 0W Sinzinger, Stefan, 1K Slangen, Pierre R., 0P Smirnov, Nikolai V., 3U Snel, Rob, 33 Soares, S. D., 1V Stasicki, Bolesław, 2J Stavridis, M., 39 Steglich, P., 3J Stettner, Armin, 2R Stöbener, Dirk, 1P Stoykova, Elena, 3Y Strassner, Johannes, 11 Ströbel, Gerald, 1P Strojnik, M., 4P Su, Rong, 0L Suliali, Nyasha J., 2Q Sun, B. Y., 3Z Sun, Shu-Huang, 3B Sung, Po-Chi, 1R Swanson, Adam, 2P Świrniak, Grzegorz, 3P Sycheva, Elena A., 4L Tang, Shouhong, 3K Tarabrin, Mikhail K., 2F Tatam, Ralph P., 1Z, 25 Taudt, Ch., 32 Teal, Paul D., 2P Tereschenko, Stanislav, 40 Theska, R., 3V Timofeev, Aleksandr N., 4J, 4L Tortschanoff, Andreas, 34 Trifanov, Oleg V., 4T Trushkina, Anna V., 3A Trusiak, Maciej, 3X Uozumi, Jun, 3H Urbach, H. P., 2Y Valyavin, Gennady G., 3R Vandenrijt, Jean-François, 1M Veroone, G., 4P Vespini, V., 4Q Villringer, C., 3J Volkov, Mikhail, 4I Volynsky, Maxim A., 3D Voznesenskaia, Mariia, 3X Voznesenskiy, Nikolay, 3X Wan, Wen, 4S Wang, Chao, 4X Wang, Daodang, 37 Wang, Quanzhao, 3K Wang, Tzu-Fong, 1A Wang, Wei-Chung, 1A, 1R Wang, Yuhang, 0L Wang, Zhichao, 37 Willemann, D. P., 1V Williams, Bryan M., 0J Williams, Stewart W., 1Z Winters, Jasper, 33 Witt, Johannes, 2R Woisetschläger, Jakob, 20 Wolff, Helmut, 44 Wrachtrup, J., 06 Wu, Min, 2H Wu, Zhou, 05, 2E, 3O Xiangli, Bin, 05, 2E Xie, Jiecheng, 12 Xie, Weichang, 16 Xu, Changda, 4W Xu, Longbo, 0A Yacoot, Andrew, 44 Yan, Baozhu, 4E Yang, Tao, 4V Yang, Yi, 4E Ye, Xin, 3K Yeoh, Stephenie, 4D, 4G Yokota, M., 2U Yu, Yun-Ting, 1A Yuan, Caojin, 29 Yue, Chong, 3Q Zalevsky, Zeev, 4C Zarafshani, P., 36 Zavalov, Yuri N., 42 Zhang, Chen, 0O, 0R Zhang, Guanliang, 4U, 4W Zhang, Hao, 24 Zhang, Jiajun, 1O Zhang, Jinke, 0J Zhang, Rui, 09 Zhang, Wenxi, 05, 2E, 3O Zhang, Zhigang, 0A Zhao, Jufeng, 37 Zhao, Jun, 37 Zhao, Junwei, 2H Zhao, Yuan'an, 3N Zheng, Donghui, 09 Zheng, Dongliang, 0V Zheng, Yalin, 0J Zherdev, A. Y., 3E Zhong, Liang, 0T Zhou, Changhe, 13 Zhou, Qiong, 4E Zhou, Xiang, 4U, 4V, 4W, 4X Zhou, You, 0A Zhu, Meiping, 3N Zhu, Rihong, 09, 28, 29 Zhu, Wenhua, 09 Zhukova, Ekaterina, 4I Zibaii, M. I., 36 Zimmermann, Manuel, 0O Zong, Fei, 2H Conference CommitteeSymposium Chair Conference Chair Conference Co-chairs
Conference Programme Committee
Session Chairs
IntroductionThis year we celebrate the ten-year anniversary of the Optical Measurement Systems for Industrial Inspection Conference, which takes place in Munich, Germany. Once again, it is an essential part of the SPIE Optical Metrology Symposium and the World of Photonics Congress. As before, the conference covers applications of optical metrology in nearly all relevant fields of industrial production. Even in times where scientific facts are sometimes ignored there is a broad consensus in science and technology that the acquisition of knowledge based on reliable data is the only option to create sustainable progress. Nowadays, optical metrology is one of the most important fields of measurement technology and is dedicated to collect data in order to control, assess, and improve industrial products and processes. Consequently, the Munich conference has established itself as an important international forum of scientific exchange and discussion of the latest results. More than 180 submissions impressively demonstrate that even after 18 years the Munich conference series is a considerable event for researchers working in optical metrology all over the world. With more than 75 oral presentations and 90 posters, the 2017 conference could hold the highest number of submissions and an outstanding level of contributions that builds the basis of its success. As in previous years, a significant number of contributions deal with optical measurement of geometrical features. A field of application of maintaining interest is the measurement of optical components, e.g. aspheres, free-form surfaces, and optical systems. Therefore, the traditional joint session took place with the EOS Conference on Manufacturing and Testing of Optical Components on Wednesday afternoon. Since spectroscopy seems to be of growing interest, even in industrial inspection, we included a Special Session called Spectroscopic Techniques in Industrial and Astronomical Applications on Tuesday afternoon. As there are always individuals playing a key role and pushing things forward we would like to thank all authors, who not only fill the conference with life but also give added value by contributing to this proceedings volume. Special thanks are due to the distinguished invited speakers, namely John H. Bruning, Corning Tropel Corp. (United States), Robert Schmitt, RWTH Aachen (Germany), Changhe Zhou, Shanghai Institute of Optics and Fine Mechanics (China), Paul C. Montgomery, Univ. de Strasbourg (France), James Millerd, 4D Technology Corp. (United States), Wei-Chung Wang, National Tsing Hua Univ. (Taiwan), and Alexis Mendez, Micron Optics, Inc. (United States) for their willingness to contribute to the conference with stimulating lectures. We would also like to express our sincere gratitude to the members of the programme committee for their support in the run-up to the conference. Additionally, many thanks are due to the SPIE staff for their professional and cooperative work during the conference organisation and the preparation of this proceedings volume. Peter Lehmann Wolfgang Osten Armando Albertazzi Gonçalves Jr. |
