Reflectivity Changes In Optical Baffle Materials Following Pulsed Electron Bombardment

Mark M. Nordberg; Christopher J. Von Benken; Edward A. Johnson

doi:10.1117/12.951444

30 June 1989 Reflectivity Changes In Optical Baffle Materials Following Pulsed Electron Bombardment

Mark M. Nordberg, Christopher J. Von Benken, Edward A. Johnson

Proceedings Volume 1050, Infrared Systems and Components III; (1989) https://doi.org/10.1117/12.951444
Event: OE/LASE '89, 1989, Los Angeles, CA, United States

Abstract

We present experimental work performed on optical baffle materials to determine reflectivity changes in the materials following pulsed electron bombardment. Many optical systems require baffle materials capable of withstanding modest levels of low-energy particle pulses with little change in the surface characteristics of the material. Analysis of currently available baffle materials not only provides information concerning current optical system capabilities, but also enables understanding of baffle failure mechanisms which could help in the development of more durable baffle materials. Results show that most optical baffle materials are susceptible to pulsed electron bombardment such that the materials exhibit a change in surface reflectivity.

Citation Download Citation

Mark M. Nordberg, Christopher J. Von Benken, and Edward A. Johnson "Reflectivity Changes In Optical Baffle Materials Following Pulsed Electron Bombardment", Proc. SPIE 1050, Infrared Systems and Components III, (30 June 1989); https://doi.org/10.1117/12.951444

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