Photonic superlattice multilayers for EUV lithography infrastructure

F. Kuchar; R. Meisels

doi:10.1117/12.2322410

19 September 2018 Photonic superlattice multilayers for EUV lithography infrastructure

F. Kuchar, R. Meisels

Proceedings Volume 10775, 34th European Mask and Lithography Conference; 1077503 (2018) https://doi.org/10.1117/12.2322410
Event: 34th European Mask and Lithography Conference, 2018, Grenoble, France

Abstract

A numerical study of EUV Bragg mirrors with superstructures is presented. These modifications of the standard Mo/Si mirror are periodic superlattices as well as depth grading of the superlattice multilayers. The main results concern a narrowing of the normal incidence peak and all-angle reflection at 13.5 nm. Best results are obtained with a combination of superlattices with 4 and 5 superperiods and depth grading. The effect of the spectral width of the EUV source is also taken into account.

Citation Download Citation

F. Kuchar and R. Meisels "Photonic superlattice multilayers for EUV lithography infrastructure", Proc. SPIE 10775, 34th European Mask and Lithography Conference, 1077503 (19 September 2018); https://doi.org/10.1117/12.2322410

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