Design Of An X-Ray Lithograahy Beam Line

R . P. Rippstein; D. L. Katcoff; J. M. Oberschmidt

doi:10.1117/12.968533

1 August 1989 Design Of An X-Ray Lithography Beam Line

R . P. Rippstein, D. L. Katcoff, J. M. Oberschmidt

Proceedings Volume 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII; (1989) https://doi.org/10.1117/12.968533
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

The design of a lithographic beamline for use on a synchrotron x-ray source is an interdisciplinary problem. The joint objectives of delivering a well collimated, high intensity beam of x-rays to a photoresist while maintaining high or ultra-high vacuum integrity requires knowledge from a variety of fields. For example, one must apply accelerator physics, materials science, x-ray optics, mechanical engineering, ultra-high vacuum technology and control systems engineering in order to design beamline optical, mechanical, safety and control elements. We provide a description of the design of a beamline for use on the VUV ring at the National Synchrotron Light Source, Brookhaven National Laboratory, to be used with a commercially available step and repeat x-ray aligner.

Citation Download Citation

R . P. Rippstein, D. L. Katcoff, and J. M. Oberschmidt "Design Of An X-Ray Lithography Beam Line", Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); https://doi.org/10.1117/12.968533

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