Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration

Ross C. McCurdy; Randall L. McEntaffer; Jake A. McCoy; Drew M. Miles

doi:10.1117/12.2530052

9 September 2019 Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration

Ross C. McCurdy, Randall L. McEntaffer, Jake A. McCoy, Drew M. Miles

Author Affiliations +

Proceedings Volume 11119, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX; 111190Y (2019) https://doi.org/10.1117/12.2530052
Event: SPIE Optical Engineering + Applications, 2019, San Diego, California, United States

Abstract

We have fabricated a blazed X-ray reflection grating with a period of 160 nm using thermally activated selective topography equilibration (TASTE). The grating was tested for diffraction efficiency using the soft X-ray reflectometer at Lawrence Berkeley National Laboratory's Advanced Light Source. Preliminary results show total absolute diffraction efficiency ≥ 40% at lower energies, with maximum single order diffraction efficiency ranging from 20-40%. Total diffraction efficiency was ≥ 30% across the entire measured band pass of 180 eV to 1300 eV.

Citation Download Citation

Ross C. McCurdy, Randall L. McEntaffer, Jake A. McCoy, and Drew M. Miles "Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration", Proc. SPIE 11119, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX, 111190Y (9 September 2019); https://doi.org/10.1117/12.2530052

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