Multicolumn e-beam lithography (MEBL) for IC traceability: MEBL enables chip ID to thwart tampering/counterfeiting

David K. Lam

doi:10.1117/12.2551952

31 March 2020 Multicolumn e-beam lithography (MEBL) for IC traceability: MEBL enables chip ID to thwart tampering/counterfeiting

David K. Lam

Author Affiliations +

Proceedings Volume 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020; 113240P (2020) https://doi.org/10.1117/12.2551952
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Multicolumn Electron Beam Lithography (MEBL), a proprietary technology platform developed by Multibeam Corporation, is being applied to enable Security Lithography – a maskless embedding of unique security information into each IC during routine wafer fabrication. This paper focuses on ensuring Secure Chip ID, which provides traceability of a chip throughout its lifecycle and enables confirmation of its unique identity and provenance. The complete MEBL embedding process is disclosed – from chip design to IC fab to verification test. This paper also shows how MEBL hardcoding of the Secure Chip ID “at the silicon level” makes the embedding process cost-efficient and tamperproof.

Citation Download Citation

David K. Lam "Multicolumn e-beam lithography (MEBL) for IC traceability: MEBL enables chip ID to thwart tampering/counterfeiting", Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 113240P (31 March 2020); https://doi.org/10.1117/12.2551952

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