Paper
30 December 2019 Ultra-precise surface machining of N-BK7 using microwave-driven reactive plasma jet machining
Faezeh Kazemi, Georg Boehm, Thomas Arnold
Author Affiliations +
Proceedings Volume 11385, Optics and Measurement International Conference 2019; 1138509 (2019) https://doi.org/10.1117/12.2547617
Event: Optics and Measurement 2019 International Conference, 2019, Liberec, Czech Republic
Abstract
Chemically reactive Plasma Jet Machining (PJM) is a contactless and efficient surface machining technique increasingly applied to the surface shape generation and error correction of various optical elements. However, the application of fluorine-based PJM to surface machining of N-BK7® is challenging since the chemical interaction between reactive plasma species and metal components of N-BK7 induces a residual layer in the contact zone and surrounding of the plasma-treated area. It was noticed that a residual layer degrades the ability of obtaining the prerequisite surface profile and causes a nonlinear and hardly predictable removal behavior with respect to the etching time. In this paper, extensive studies are conducted for relaxing constraints in applying the fluorine-based PJM to the surface machining of N-BK7, particularly regarding to the manufacture of freeform optical elements. In this regard, the chemical composition of residual layer is evaluated by using SEM/EDX analysis aiming at clarifying the chemical kinetics between plasma generated active particles and the N-BK7 surface atoms. Furthermore, the etching behavior of N-BK7 is compared with Fused Silica to verify the optimality of obtained results. Finally, the area machining is tested at different plasma dwell times to evaluate the predictability and regularity of results.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Faezeh Kazemi, Georg Boehm, and Thomas Arnold "Ultra-precise surface machining of N-BK7 using microwave-driven reactive plasma jet machining", Proc. SPIE 11385, Optics and Measurement International Conference 2019, 1138509 (30 December 2019); https://doi.org/10.1117/12.2547617
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Cited by 4 scholarly publications.
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KEYWORDS
Etching

Plasma

Chemical analysis

Optical components

Chemical species

Metals

Optical calibration

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