Multi-beam mask writer MBM-2000

Hiroshi Matsumoto; Keisuke Yamaguchi; Hayato Kimura; Kenichi Yasui

doi:10.1117/12.2573147

20 September 2020 Multi-beam mask writer MBM-2000

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Kenichi Yasui

Proceedings Volume 11518, Photomask Technology 2020; 115180A (2020) https://doi.org/10.1117/12.2573147
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

Abstract

This paper covers the writing performance of our multi-beam mask writer, MBM-1000, which has been developed for the 5 nm technology node. It exposes low sensitivity resist faster than VSB writers and prints complex patterns with better fidelity. We will describe its writing performance and compare it with our VSB writer, EBM-9500 PLUS. MBM-1000 has pixel-level dose correction (PLDC). PLDC modulates dose profile at pixel level to improve pattern fidelity and patterning resolution. It is integrated with MBM-1000 data path and runs inline. We will also report functions and writing results of MBM-1000 with PLDC.

Conference Presentation

Citation Download Citation

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, and Kenichi Yasui "Multi-beam mask writer MBM-2000", Proc. SPIE 11518, Photomask Technology 2020, 115180A (20 September 2020); https://doi.org/10.1117/12.2573147

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available