Progress on EUV pellicle and pellicle infrastructure for high volume manufacturing

Raymond Lafarre; Raymond Maas

doi:10.1117/12.2587058

21 February 2021 Progress on EUV pellicle and pellicle infrastructure for high volume manufacturing

Raymond Lafarre, Raymond Maas

Author Affiliations +

Proceedings Volume 11609, Extreme Ultraviolet (EUV) Lithography XII; 1160912 (2021) https://doi.org/10.1117/12.2587058
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

In the past year ASML NXE pellicle has made a significant steps. ASML EUV Customers can order in volume pellicles, which meet all the production KPI. The next step to meet the industry high volume manufacturing requirements, is releasing high EUV transmittance, high power compatibility and superior imaging performance membranes, made of novel materials. In this presentation we will give a comprehensive overview on the current development status of the NXE pellicle product, including a future outlook to the EUV pellicle roadmap.

Conference Presentation

Citation Download Citation

Raymond Lafarre and Raymond Maas "Progress on EUV pellicle and pellicle infrastructure for high volume manufacturing", Proc. SPIE 11609, Extreme Ultraviolet (EUV) Lithography XII, 1160912 (21 February 2021); https://doi.org/10.1117/12.2587058

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE