Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications

Xavier Chevalier; Cindy Gomes Correia; Gwenaelle Pound-Lana; Philippe Bézard; Matthieu Sérégé; Camille Petit-Etienne; Guillaume Gay; Gilles Cunge; Benjamin Cabannes-Boué; Célia Nicolet; Christophe Navarro; Ian Cayrefourcq; Marcus Müller; Georges Hadziioannou; Ilias Iliopoulos; Guillaume Fleury; Marc Zelsmann

doi:10.1117/12.2583717

22 February 2021 Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications

Xavier Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana, Philippe Bézard, Matthieu Sérégé, Camille Petit-Etienne, Guillaume Gay, Gilles Cunge, Benjamin Cabannes-Boué, Célia Nicolet, Christophe Navarro, Ian Cayrefourcq, Marcus Müller, Georges Hadziioannou, Ilias Iliopoulos, Guillaume Fleury, Marc Zelsmann

Author Affiliations +

Proceedings Volume 11612, Advances in Patterning Materials and Processes XXXVIII; 116120O (2021) https://doi.org/10.1117/12.2583717
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

Results for the self-assembly of lamellar silicon-containing high-χ block copolymers (BCP) with innovative neutral top-coat design are presented. We demonstrate that these materials and associated processes are compatible with a standard lithographic process, and oriented toward a potential high volume manufacturing. We show that this dedicated technology is able to guarantee the stability and planarity of the stack even at elevated self-assembly bake temperatures, and opens new opportunity in the fields of 3D BCPs stacks. Finally, we show interesting results for the etch-transfer of a lamellar BCP in silicon.

Conference Presentation

Citation Download Citation

Xavier Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana, Philippe Bézard, Matthieu Sérégé, Camille Petit-Etienne, Guillaume Gay, Gilles Cunge, Benjamin Cabannes-Boué, Célia Nicolet, Christophe Navarro, Ian Cayrefourcq, Marcus Müller, Georges Hadziioannou, Ilias Iliopoulos, Guillaume Fleury, and Marc Zelsmann "Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications", Proc. SPIE 11612, Advances in Patterning Materials and Processes XXXVIII, 116120O (22 February 2021); https://doi.org/10.1117/12.2583717

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available