Digital scanner, optical maskless exposure tool with DUV solid state laser

Yoji Watanabe; Hirotaka Kono; Yuho Kanaya; Yusuke Saito; Toshiaki Sakamoto; Soichi Owa; Noriyuki Hirayanagi; Thomas Koo; Craig Poppe; David Tseng; Conrad Sorensen; Hwan Lee; Stephen Renwick; Bausan Yuan

doi:10.1117/12.2583680

22 February 2021 Digital scanner, optical maskless exposure tool with DUV solid state laser

Yoji Watanabe, Hirotaka Kono, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Soichi Owa, Noriyuki Hirayanagi, Thomas Koo, Craig Poppe, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, Bausan Yuan

Author Affiliations +

Proceedings Volume 11613, Optical Microlithography XXXIV; 1161309 (2021) https://doi.org/10.1117/12.2583680
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

Digital Scanner (DS), a DUV optical maskless exposure tool is being developed. It uses a micromirror-type spatial light modulator (SLM) to create the “mask” pattern combined with a solid state laser with wavelength of 193 or 248 nm. The exposure concept of DS and advantage of solid state laser as an exposure light source is described. DS proof-of-concept tool with resolution of half-pitch 80 nm L/S was developed. The exposure results of maskless unique application such as large area printing and chip ID printing for security purposes are shown.

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Yoji Watanabe, Hirotaka Kono, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Soichi Owa, Noriyuki Hirayanagi, Thomas Koo, Craig Poppe, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, and Bausan Yuan "Digital scanner, optical maskless exposure tool with DUV solid state laser", Proc. SPIE 11613, Optical Microlithography XXXIV, 1161309 (22 February 2021); https://doi.org/10.1117/12.2583680

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