Directional and selective patterning of EUV absorbers

Xia Sang; Yantao Xia; Jane P. Chang; Philippe Sautet

doi:10.1117/12.2585410

26 February 2021 Directional and selective patterning of EUV absorbers

Xia Sang, Yantao Xia, Jane P. Chang, Philippe Sautet

Proceedings Volume 11615, Advanced Etch Technology and Process Integration for Nanopatterning X; 1161503 (2021) https://doi.org/10.1117/12.2585410
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

The talk presents pertinent surface chemistries required to achieve a highly anisotropic etch of metal absorbers for EUV masks, with the goal of realizing a nearly vertical sidewall angle of 90º. The selection of gas phase chemistries is crucial to the success of the patterning process, therefore the selection criteria, based on thermodynamic and kinetic assessment, will be explained. The general approach combines either reactive ion etching or ion beam etching with atomic layer etching processes where the sequential surface reactions starts with controlled surface modification, followed by selective removal of the modified layer. This general approach can be applied to a variety of EUV mask materials, making it possible to tackle more complex material systems as needed.

Conference Presentation

Citation Download Citation

Xia Sang, Yantao Xia, Jane P. Chang, and Philippe Sautet "Directional and selective patterning of EUV absorbers", Proc. SPIE 11615, Advanced Etch Technology and Process Integration for Nanopatterning X, 1161503 (26 February 2021); https://doi.org/10.1117/12.2585410

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