New material measure for the calibration of areal-optical measuring instruments and its demands on fabrication

Julian Hering; Matthias Eifler; Xiukun Hu; Gaoliang Dai; Jörg Seewig; Georg von Freymann

doi:10.1117/12.2579635

5 March 2021 New material measure for the calibration of areal-optical measuring instruments and its demands on fabrication

Julian Hering, Matthias Eifler, Xiukun Hu, Gaoliang Dai, Jörg Seewig, Georg von Freymann

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Proceedings Volume 11696, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIV; 1169612 (2021) https://doi.org/10.1117/12.2579635
Event: SPIE OPTO, 2021, Online Only

Abstract

For nowadays and future resolution calibration tasks of areal-optical measuring instruments, micro structures with nanometer details, covering as most as possible of these instrument’s characteristics, are needed. Since current calibration measures do not fully satisfy all of these characteristics, we report on a newly chirped topography, that allows for the very first time for a holistic analysis of all the required attributes. To realize this highly resolved micro structure, e.g., an aberration-free laser lithography system will become indispensable in near future. Therefore, we’ve implemented a Gerchberg-Saxton based algorithm, improving any focal intensity distribution by the use of a so-called double-helix.

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Julian Hering, Matthias Eifler, Xiukun Hu, Gaoliang Dai, Jörg Seewig, and Georg von Freymann "New material measure for the calibration of areal-optical measuring instruments and its demands on fabrication", Proc. SPIE 11696, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIV, 1169612 (5 March 2021); https://doi.org/10.1117/12.2579635

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KEYWORDS

Calibration

Aberration correction

Lithography

Optical aberrations

Optical calibration

Point spread functions

Standards development

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