Silicon-germanium alloy for infrared GRIN materials

Yasutomo Arai; Yoshifumi Katano; Koji Tsubaki; Shigeki Uchida; Kyoichi Kinoshita

doi:10.1117/12.2584502

12 April 2021 Silicon-germanium alloy for infrared GRIN materials

Yasutomo Arai, Yoshifumi Katano, Koji Tsubaki, Shigeki Uchida, Kyoichi Kinoshita

Proceedings Volume 11737, Advanced Optics for Imaging Applications: UV through LWIR VI; 117370F (2021) https://doi.org/10.1117/12.2584502
Event: SPIE Defense + Commercial Sensing, 2021, Online Only

Conference Poster

Abstract

Silicon (n~3.4) and germanium (n~4.0) are harmless and conventional infrared optical materials. SiGe alloys, mixed crystals of Si and Ge, permit a flexible Si/Ge ratio in the crystals, which results in a refractive-index gradient. We report on the Travelling Liquidus-Zone (TLZ) method for growing both gradient and homogeneous concentration SiGe crystals. The wavelength dependences of the refractive indices from 2.0 to 20 μm of the 20 mm diameter Si1-XGeX (x=0.32 and 0.63), Si and Ge disks were measured using an ellipsometry. An infrared lens system made of germanium and homogeneous concentration SiGe crystals has been designed.

Conference Presentation

Citation Download Citation

Yasutomo Arai, Yoshifumi Katano, Koji Tsubaki, Shigeki Uchida, and Kyoichi Kinoshita "Silicon-germanium alloy for infrared GRIN materials", Proc. SPIE 11737, Advanced Optics for Imaging Applications: UV through LWIR VI, 117370F (12 April 2021); https://doi.org/10.1117/12.2584502

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