A comparative study of dry-etching nanophotonic devices on a LiNbO3-on-insulator material platform

Chen Shen; Chengli Wang; Yifan Zhu; Jinbo Wu; Yang Chen; Zhongxu Li; Kai Huang; Xiaomeng Zhao; Sannian Song; Jiaxiang Zhang; Xin Ou

doi:10.1117/12.2590415

28 February 2021 A comparative study of dry-etching nanophotonic devices on a LiNbO₃-on-insulator material platform

Chen Shen, Chengli Wang, Yifan Zhu, Jinbo Wu, Yang Chen, Zhongxu Li, Kai Huang, Xiaomeng Zhao, Sannian Song, Jiaxiang Zhang, Xin Ou

Author Affiliations +

Proceedings Volume 11781, 4th Optics Young Scientist Summit (OYSS 2020); 117810X (2021) https://doi.org/10.1117/12.2590415
Event: Optics Frontier: Optics Young Scientist Summit, 2020, Ningbo, China

Abstract

Three different novel dry-etching methods have been employed to fabricate nanophotonic devices upon a thin-film lithium niobate on insulator material platform. Different dry-etching processes and their advantages, drawbacks and applicable scenarios are systematically studied. Ultra-smooth etching surface with roughness of 0.46 nm (Rq), low-loss ridge waveguides with extracted propagation loss of 1.42 dB/cm, and microring resonators with high optical quality factors up to 1.4×10⁵ are demonstrated using the optimized low-loss etching recipe. The low-loss etching technique lays a foundation for monolithic integration of passive optical components with quantum dots, on-chip broadband electro- optic modulators and wafer-scale lithium niobate integrated photonic circuits.

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Chen Shen, Chengli Wang, Yifan Zhu, Jinbo Wu, Yang Chen, Zhongxu Li, Kai Huang, Xiaomeng Zhao, Sannian Song, Jiaxiang Zhang, and Xin Ou "A comparative study of dry-etching nanophotonic devices on a LiNbO₃-on-insulator material platform", Proc. SPIE 11781, 4th Optics Young Scientist Summit (OYSS 2020), 117810X (28 February 2021); https://doi.org/10.1117/12.2590415

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