Value of EUV lithography for DRAM manufacturing

Chang-Moon Lim

doi:10.1117/12.2605763

6 October 2021 Value of EUV lithography for DRAM manufacturing

Chang-Moon Lim

Author Affiliations +

Proceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography 2021; 118540W (2021) https://doi.org/10.1117/12.2605763
Event: SPIE Photomask Technology + EUV Lithography, 2021, Online Only

Abstract

It seems like EUV is at the center stage of semiconductor industry nowadays. Several leading companies has already established manufacturing foothold on EUV and add the number of equipment steadily where double-digit number of tools are already operational in their realm. Mostly logic and foundry sectors have moved earlier for EUV high volume manufacturing but memory makers are also following suit. In the presentation, it will be reviewed what specific aspects has differentiated the memory sector from logic and foundry in view of EUV adoption. The value of EUV lithography by comparing that of ArF immersion based multiple patterning techniques will be examined. It will be also touched on the current status and future extendibility of EUV lithography in view of DRAM manufacturing will be briefly addressed also.

Conference Presentation

Citation Download Citation

Chang-Moon Lim "Value of EUV lithography for DRAM manufacturing", Proc. SPIE 11854, International Conference on Extreme Ultraviolet Lithography 2021, 118540W (6 October 2021); https://doi.org/10.1117/12.2605763

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