Holographic lithography for microcircuits

Ray T. Chen; Lev S. Sadovnik; Tin M. Aye; Tomasz P. Jannson

doi:10.1117/12.17991

1 May 1990 Holographic lithography for microcircuits

Ray T. Chen, Lev S. Sadovnik, Tin M. Aye, Tomasz P. Jannson

Proceedings Volume 1212, Practical Holography IV; (1990) https://doi.org/10.1117/12.17991
Event: OE/LASE '90, 1990, Los Angeles, CA, United States

Abstract

Experimental results of a high resolution holographic imaging system using lensless geometry are demonstrated. A master mask is imaged on a photopolymer and is recorded as a volume hologram, which is then employed as the hologrphic mask. Formation of a 0.5un resolution image was consistently observed in a large field with illumination by an Argon laser operating at 457 nm, and the pattern was successfully recorded on photoresist.

Citation Download Citation

Ray T. Chen, Lev S. Sadovnik, Tin M. Aye, and Tomasz P. Jannson "Holographic lithography for microcircuits", Proc. SPIE 1212, Practical Holography IV, (1 May 1990); https://doi.org/10.1117/12.17991

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