PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
Errors in grating fabrication contribute to ghosting and reduce efficiency, decreasing the signal-to-noise ratio of observations. It has historically been challenging to quantify fabrication errors across large areas using common tools such as scanning electron microscopes due to time and automation constraints. Interferometry allows for direct, large area measurement of these characteristics as a metric for success. We present interferometric measurements of laminar which have been used to characterize and optimize EBL tool error (“stitch error”) over large areas and detail future measurements of the impact of KOH etching on the groove placement accuracy. Additionally we comment on future work replicating EBL gratings via nanoimprint lithography.
Conference Presentation
(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Cecilia R. Fasano,Casey DeRoo,Keri Hoadley,Jared Termini, andFabien Grisé
"Informing the fabrication of ultraviolet reflection gratings with interferometric measurements", Proc. SPIE 12678, UV, X-Ray, and Gamma-Ray Space Instrumentation for Astronomy XXIII, 126780S (27 September 2023); https://doi.org/10.1117/12.2676138
ACCESS THE FULL ARTICLE
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
The alert did not successfully save. Please try again later.
Cecilia R. Fasano, Casey DeRoo, Keri Hoadley, Jared Termini, Fabien Grisé, "Informing the fabrication of ultraviolet reflection gratings with interferometric measurements," Proc. SPIE 12678, UV, X-Ray, and Gamma-Ray Space Instrumentation for Astronomy XXIII, 126780S (27 September 2023); https://doi.org/10.1117/12.2676138