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After fairly extensive discussions of the advantages and disadvantages of low energy and
high energy ion beam bombardment of a growing film, we review briefly a number of
experimental results obtained with various samples made with low voltage reactive ion
plating deposition. The availability of a state-of-the-art high vacuum coating machine
specifically equipped for this process is the foundation for a major leap toward achieving
near-perfect optical coatings. The high density of ion plated thin films makes them
impermeable to water vapor and corrosive solutions. This has been demonstrated with
protected aluminum mirrors, polarizers, and infrared anti-reflection coatings. An
indication of the high packing density is the substantially higher refractive index than
that of comparable layers deposited with either conventional electron beam evaporation
or ion assisted deposition. The spectral transmittance of multilayer stacks of oxide thin
films is lower than expected from theoretical predictions which assume absorption-free
dielectrics. The observed absorption is primarily of an interface nature rather than a
volume effect and occurs predominantly in combinations of Ti02 and Si02 thin films.
Karl H. Guenther
"Recent progress in optical coating technology: low-voltage ion plating deposition", Proc. SPIE 1270, Optical Thin Films and Applications, (1 August 1990); https://doi.org/10.1117/12.20378
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Karl H. Guenther, "Recent progress in optical coating technology: low-voltage ion plating deposition," Proc. SPIE 1270, Optical Thin Films and Applications, (1 August 1990); https://doi.org/10.1117/12.20378