Paper
11 October 2023 Evaluation of commercial e-beam resist in Japan
Yoichi Takahashi
Author Affiliations +
Abstract
In this paper, I will report basic properties and process evaluation of commercially available electron beam resists in Japan. Furthermore, I will give an outline of the trends of reasearch and development of electron beam resists for mask making.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yoichi Takahashi "Evaluation of commercial e-beam resist in Japan", Proc. SPIE 12808, Bay Area Chrome Users Society Symposium 1984, 1280803 (11 October 2023); https://doi.org/10.1117/12.3011868
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
Back to Top