In-situ nanostructure fabrication using finely focused ion beams

Lloyd R. Harriott

doi:10.1117/12.20782

1 October 1990 In-situ nanostructure fabrication using finely focused ion beams

Lloyd R. Harriott

Proceedings Volume 1284, Nanostructure and Microstructure Correlation with Physical Properties of Semiconductors; (1990) https://doi.org/10.1117/12.20782
Event: Advances in Semiconductors and Superconductors: Physics Toward Devices Applications, 1990, San Diego, CA, United States

Abstract

Nanostructure fabrication for optoelectronic and quantum-effect devices can benefit from the greatly improved surface layer quality and low contamination offered by all vacuum processing. Finely focused ion beams can be used in a variety of ways for vacuum-compatable patterning on a nanometer size scale offering the potential of patterned devices with clean epitaxial interfaces and low dimensional confinement Several of these ion beam patterning techniques will be reviewed.

Citation Download Citation

Lloyd R. Harriott "In-situ nanostructure fabrication using finely focused ion beams", Proc. SPIE 1284, Nanostructure and Microstructure Correlation with Physical Properties of Semiconductors, (1 October 1990); https://doi.org/10.1117/12.20782

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