Photoelectron beam from semiconductor photocathodes leading to new inspection technologies

T. Nishitani; Y. Arakawa; K. Niimi; Y. Otsuka; D. Sato; A. Koizumi; H. Shikano; H. Iijima; Y. Honda; H. Amano

doi:10.1117/12.3010730

9 April 2024 Photoelectron beam from semiconductor photocathodes leading to new inspection technologies

T. Nishitani, Y. Arakawa, K. Niimi, Y. Otsuka, D. Sato, A. Koizumi, H. Shikano, H. Iijima, Y. Honda, H. Amano

Proceedings Volume 12955, Metrology, Inspection, and Process Control XXXVIII; 1295533 (2024) https://doi.org/10.1117/12.3010730
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

Semiconductor photocathodes are electron beam sources with versatile electron beam performance such as pulsed structure as well as high beam current with high monochromaticity. Photocathode using GaN semiconductor material has solved the durability problem, resulting in the development of a compact photocathode electron gun suitable for industrial technology. The photocathode electron gun can be retrofitted to existing electron microscopes, has the same brightness as a cold field emitter cathode, and the pulsed beam not only brings selective beam irradiation to arbitrary area in the field of view in SEM imaging, but also allows blur-free TEM imaging of moving samples.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

T. Nishitani, Y. Arakawa, K. Niimi, Y. Otsuka, D. Sato, A. Koizumi, H. Shikano, H. Iijima, Y. Honda, and H. Amano "Photoelectron beam from semiconductor photocathodes leading to new inspection technologies", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 1295533 (9 April 2024); https://doi.org/10.1117/12.3010730

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