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This study continues examining the topological dependence of diffuse reflectance for NIR-SWIR absorbing dyes on substrates. The dependence is examined by case studies using composite-material layers that include IR absorbing dyes on fabric substrates. Understanding the topological dependence of diffuse reflectance can assist in determining optimal composite-material configurations for specific reflectance specifications, which can include UV protecting materials.
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
J. Duncan,T. Mayo,S. Ramsey, andS. G. Lambrakos
"Sensitivity analysis of diffuse reflectance for NIR-SWIR absorbing dyes on substrates with respect to surface topology", Proc. SPIE 13117, Enhanced Spectroscopies and Nanoimaging 2024, 1311711 (4 October 2024); https://doi.org/10.1117/12.3025390
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J. Duncan, T. Mayo, S. Ramsey, S. G. Lambrakos, "Sensitivity analysis of diffuse reflectance for NIR-SWIR absorbing dyes on substrates with respect to surface topology," Proc. SPIE 13117, Enhanced Spectroscopies and Nanoimaging 2024, 1311711 (4 October 2024); https://doi.org/10.1117/12.3025390