Development progress of Gigaphoton’s LPP EUV light source for inspection systems

Atsushi Ueda; Fumio Iwamoto; Yoshifumi Ueno; Shinji Nagai; Kenichi Miyao; Hideyuki Hayashi; Takuya Ishii; Tamotsu Abe; Hiroaki Nakarai; Takashi Saitou

doi:10.1117/12.3034058

12 November 2024 Development progress of Gigaphoton’s LPP EUV light source for inspection systems

Atsushi Ueda, Fumio Iwamoto, Yoshifumi Ueno, Shinji Nagai, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saitou

Author Affiliations +

Proceedings Volume 13215, International Conference on Extreme Ultraviolet Lithography 2024; 132150X (2024) https://doi.org/10.1117/12.3034058
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Conference Poster

Abstract

Gigaphoton Inc. presents a Sn-LPP EUV light source for mask inspection tools. This light source uses a minimum-mass Sn droplet generator with an in-line Sn fuel supply system, a double-pulse laser irradiation scheme with precise shooting control and a debris mitigation technology with H₂ buffer-gas flow. During 1500 hours of continuous operation, a brightness of 120W/mm²sr at the plasma point, a stable EUV energy 3σ-value below 5% and a high availability of 99% have been obtained without reflectivity degradation of the EUV collector mirror. We are currently developing key components for higher repetition rate to further increase the brightness.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Atsushi Ueda, Fumio Iwamoto, Yoshifumi Ueno, Shinji Nagai, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, and Takashi Saitou "Development progress of Gigaphoton’s LPP EUV light source for inspection systems", Proc. SPIE 13215, International Conference on Extreme Ultraviolet Lithography 2024, 132150X (12 November 2024); https://doi.org/10.1117/12.3034058

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