Effective medium approximation for EUV multilayer intermixing

Seulki Roh; Taewon Go; Chungik Oh; Hanjune Yoon; Hakseung Han; Sanghee Lee

doi:10.1117/12.3034567

12 November 2024 Effective medium approximation for EUV multilayer intermixing

Seulki Roh, Taewon Go, Chungik Oh, Hanjune Yoon, Hakseung Han, Sanghee Lee

Author Affiliations +

Proceedings Volume 13216, Photomask Technology 2024; 132160A (2024) https://doi.org/10.1117/12.3034567
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

We propose a novel, rigorous but simplified method for modeling multilayer systems with the well-known effective medium approximation (EMA) particularily for the intermixed interface. The EMA defines the intermixed layer as a mixture of surrounding layers with a proper volume fraction of each and with this the inhomogeneous mixing can be effectively treated. The EMA and transfer matrix method for the multilayer system predicts the reflection of the system at any angle in a given wavelength range with a superb quality, enabling simulations with a precise fit of measured spectra, and accurate and physically robust extraction of optical parameters. Moreover, the intermixing can be quantified, thus, can be considered in a more systematic way. Demonstration is given with in-line production data from Samsung Photomask Shop.

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(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Seulki Roh, Taewon Go, Chungik Oh, Hanjune Yoon, Hakseung Han, and Sanghee Lee "Effective medium approximation for EUV multilayer intermixing", Proc. SPIE 13216, Photomask Technology 2024, 132160A (12 November 2024); https://doi.org/10.1117/12.3034567

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