3D structures sidewalls tuning using smart grayscale photolithography mask strategies

Gaby Bélot; Aurélien Fay; Élodie Sungauer; Merlin Moreau; Sébastien Bérard-Bergery; Cécile Gourgon

doi:10.1117/12.3028461

18 September 2024 3D structures sidewalls tuning using smart grayscale photolithography mask strategies

Gaby Bélot, Aurélien Fay, Élodie Sungauer, Merlin Moreau, Sébastien Bérard-Bergery, Cécile Gourgon

Proceedings Volume 13273, 39th European Mask and Lithography Conference (EMLC 2024); 132730A (2024) https://doi.org/10.1117/12.3028461
Event: 39th European Mask and Lithography Conference (EMLC 2024), 2024, Grenoble, France

Abstract

In the past decades, the necessity for 3D components became none to be questioned in numerous fields. With these 3D components come new challenges. As an example, the performance of Fabry-Perot based optical filtering devices is dependent on the quality of its sidewalls definition. In this study, we are investigating the mask data preparation method for the patterning of staircase structures thanks to grayscale photolithography. Such structures are used as multiple Fabry-Perot cavities in the context of multispectral imaging. Grayscale photolithography is considered for its offer in 3D micro-fabrication at high throughput. First off, the sidewalls horizontal spread is studied through simulations for different configurations. Metrics are defined and proposed to evaluate the quality of transitions. Secondly, three mask data preparation method are studied : a numerical optimization algorithm as well as an image-to-image deep-learning based workflow are first shown to not meet our application morphological needs. In response, a third method is proposed and is based on local sizings libraries. The recourse to this strategy is shown to have great potential for an improvement of the sidewalls behaviour. However, this methodology taking its first steps, its performance is not pushed to the limit in its current state. As a result, a full mask data preparation flow applied to staircase structures is proposed in the perspectives of this work. With this study we illustrated the importance of the photomask design strategy for the fine tuning of 3D structures sidewalls. We showed the possibility, using a smart mask construction strategy, to produce application-wise enhanced vertical transitions and open the door to further studies toward even steeper sidewalls.

Citation Download Citation

Gaby Bélot, Aurélien Fay, Élodie Sungauer, Merlin Moreau, Sébastien Bérard-Bergery, and Cécile Gourgon "3D structures sidewalls tuning using smart grayscale photolithography mask strategies", Proc. SPIE 13273, 39th European Mask and Lithography Conference (EMLC 2024), 132730A (18 September 2024); https://doi.org/10.1117/12.3028461

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KEYWORDS

Optical lithography

Chromium

Tunable filters

3D mask effects

Photomasks

Simulations

Fabry Perot interferometers

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