Optical Problems Of Small Geometry Automatic Mask Inspection

Kenneth A. Snow

doi:10.1117/12.956118

6 September 1978 Optical Problems Of Small Geometry Automatic Mask Inspection

Kenneth A. Snow

Proceedings Volume 0135, Developments in Semiconductor Microlithography III; (1978) https://doi.org/10.1117/12.956118
Event: Developments in Semiconductor Microlithography III, 1978, San Jose, United States

Abstract

As geometry sizes decrease and mask sizes increase, the importance of high speed automatic mask inspection is increasingly evident. High speed scanning of large surfaces, while recording the location of artifacts less than 1/10 the size of a hair in less time than it takes to talk about it, presents some formidable problems for the optical architecture of the system.

Citation Download Citation

Kenneth A. Snow "Optical Problems Of Small Geometry Automatic Mask Inspection", Proc. SPIE 0135, Developments in Semiconductor Microlithography III, (6 September 1978); https://doi.org/10.1117/12.956118

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