Comparison of plasma source with synchrotron source in the Center for X-ray Lithography

Jerry Z.Y. Guo; Franco Cerrina

doi:10.1117/12.47377

1 August 1991 Comparison of plasma source with synchrotron source in the Center for X-ray Lithography

Jerry Z.Y. Guo, Franco Cerrina

Proceedings Volume 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing; (1991) https://doi.org/10.1117/12.47377
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

The characteristics of sources for x-ray lithography are analyzed in terms of image formation. In particular, laser-induced plasma and synchrotron radiation sources are compared. New design considerations are presented for both types of sources, and we show that both can be good x-ray lithography sources in terms of image formation.

Citation Download Citation

Jerry Z.Y. Guo and Franco Cerrina "Comparison of plasma source with synchrotron source in the Center for X-ray Lithography", Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); https://doi.org/10.1117/12.47377

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