Paper
1 November 1991 Preparation and magneto-optical properties of NdDyFeCoTi amorphous films
Si Jun Zhang, Xiao Yong Yang, Xiaowen Li, Feng Ping Zhang
Author Affiliations +
Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47325
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China
Abstract
Amorphous NdDyFeCoTi films were prepared by RF magnetron sputtering onto glass substrates at zero bias, low Ar pressure of 3 - 7 mTorr and low input sputtering power of 100 - 300 W. They were overcoated by a SiO2 protective layer. The magnetic and magneto- optical properties of these films were studied by VSM, Kerr hysteresis tracer, Auger electron spectrum, and electron microprobe. The Kerr angle (theta)k of 0.3 degree(s) and the coercive force Hc of 3 - 5 KOe have been found. The stability of the films was examined by exposure in dry air for one month and annealing at 100 - 250 degree(s)C. The coercive force Hc changed with the film thickness. It was found that the preparation conditions had obvious effects on the structure and properties of the film. The Ar pressure and substrate bias voltage affected the microstructure, magneto-optical properties, and the stability. The films prepared under these conditions have dense, smooth, featureless, highly disorder amorphous structure without any obvious void and columnar microstructure. The aging experiment showed that these films had good oxidation and corrosion resistance. The NdDyFeCoTi films prepared under optimal conditions exhibited excellent magneto-optical recording performance with recording laser power of 5 mW and applied magnetic field of 500 Oe.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Si Jun Zhang, Xiao Yong Yang, Xiaowen Li, and Feng Ping Zhang "Preparation and magneto-optical properties of NdDyFeCoTi amorphous films", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47325
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KEYWORDS
Magnetism

Oxygen

Sputter deposition

Argon

Thin films

Oxidation

Physics

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