Thin film fabrication of stabilized zirconia for solid oxide fuel cells

Toshihiko Setoguchi; Koichi Eguchi; Hiromichi Arai

doi:10.1117/12.47301

1 November 1991 Thin film fabrication of stabilized zirconia for solid oxide fuel cells

Toshihiko Setoguchi, Koichi Eguchi, Hiromichi Arai

Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47301
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China

Abstract

Thin or thick films of YSZ were fabricated by plasma spraying, slip casting, slurry coating, spray pyrolysis, and RF-ion plating methods. A porous electrode substrate of Ni/YSZ cermet anode or La_0.06Sr_0.4MnO₃ cathode was used as a support for YSZ film fabrication. Current-voltage characteristic of hydrogen-oxygen fuel cell with a slurry coated or a slip casted YSZ film was excellent, because these films were dense. The plasma spraying method was most suitable for quick fabrication of cell stacks.

Citation Download Citation

Toshihiko Setoguchi, Koichi Eguchi, and Hiromichi Arai "Thin film fabrication of stabilized zirconia for solid oxide fuel cells", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47301

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