Improved vibration isolation system for a scanning electron microscope

Peter A. Jennings; John W. Willson; Roy H. Bannister

doi:10.1117/12.56820

1 February 1992 Improved vibration isolation system for a scanning electron microscope

Peter A. Jennings, John W. Willson, Roy H. Bannister

Proceedings Volume 1619, Vibration Control in Microelectronics, Optics, and Metrology; (1992) https://doi.org/10.1117/12.56820
Event: SPIE Technical: OPTCON '91, 1991, San Jose, CA, United States

Abstract

High resolution scanning electron microscopes (SEMs) are placed in a wide variety of application sizes. The site environmental vibration levels can vary considerably due to geographical location. building construction, location within the building and any processes which may be running within or near the building. This paper briefly reviews the primary sources of mechanical disturbances which can have a detrimental effect on the resolution of the SEM showing the importance of considering the entire SEM structure. The use of finite element techniques to investigate system structural performance and its relevance to low frequency ''rigid body'' motion at nanometric levels is discussed together with an improved design of passive vibration isolation using a focalized system. In this method, the lines of action of the support forces are considered with regard to the position of the center of gravity of the supported structure.

Citation Download Citation

Peter A. Jennings, John W. Willson, and Roy H. Bannister "Improved vibration isolation system for a scanning electron microscope", Proc. SPIE 1619, Vibration Control in Microelectronics, Optics, and Metrology, (1 February 1992); https://doi.org/10.1117/12.56820

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