On-orbit ion cleaning of cryogenic optical surfaces

Barret Lippey; Darrell A. Gleichauf

doi:10.1117/12.140743

18 December 1992 On-orbit ion cleaning of cryogenic optical surfaces

Barret Lippey, Darrell A. Gleichauf

Proceedings Volume 1754, Optical System Contamination: Effects, Measurement, Control III; (1992) https://doi.org/10.1117/12.140743
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

Two methods of ion cleaning of contaminant films from spacecraft optics while on orbit are examined. The first method uses energetic electron sputtering, and the second uses low-energy oxygen ion (LEOI) reactive etching. Water, ammonia, and carbon dioxide cryofilms with electron sputtering have been successfully removed. The mirror materials being cleaned include bare beryllium and protected aluminum coated optics. No damage to these ultralow-scatter mirror materials has been observed, even when the mirrors are purposely overcleaned with electrons by any orders of magnitude. Although electron cleaning sometimes polymerizes or carbonizes organic contamination instead of removing it, LEOIs are able to clean both polymerized and unpolymerized organic material at room temperature without causing damage.

Citation Download Citation

Barret Lippey and Darrell A. Gleichauf "On-orbit ion cleaning of cryogenic optical surfaces", Proc. SPIE 1754, Optical System Contamination: Effects, Measurement, Control III, (18 December 1992); https://doi.org/10.1117/12.140743

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