Laser plasma sources for soft x-ray projection lithography

Martin C. Richardson; William T. Silfvast; Howard Bender III; Art Hanzo; Feng Jin; Victor P. Yanovsky

doi:10.1117/12.147392

24 June 1993 Laser plasma sources for soft x-ray projection lithography

Martin C. Richardson, William T. Silfvast, Howard Bender III, Art Hanzo, Feng Jin, Victor P. Yanovsky

Proceedings Volume 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992; (1993) https://doi.org/10.1117/12.147392
Event: Optical Materials for High Power Lasers, 1992, Boulder, CO, United States

Abstract

Compact laser plasma soft x-ray sources are under serious consideration for projection lithography. Current baseline designs for soft x-ray projection lithography systems place stringent performance and cost requirements on a laser plasma soft x-ray source. The x-ray source must meet specific criteria relating to x-ray fluence in the 13 nm region, the wavelength of preference for projection lithography, to output stability at high (kHz) repetition-rates, to continuous long term operation and to operating costs. Moreover the source must operate in a vacuum enclosure in close proximity to costly x-ray and optical elements which must remain in pristine condition, free from degradation by particulate and plasma emission emanating from the source. We discuss these requirements, and review experiments leading to the optimal design of a laser plasma soft x-ray source.

Citation Download Citation

Martin C. Richardson, William T. Silfvast, Howard Bender III, Art Hanzo, Feng Jin, and Victor P. Yanovsky "Laser plasma sources for soft x-ray projection lithography", Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); https://doi.org/10.1117/12.147392

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