Paper
24 June 1993 Investigation of evolution of microprofile on silicon surface under high-power laser-pulsed effect
Alexander F. Banishev, I. M. Chistyakov
Author Affiliations +
Proceedings Volume 1856, Laser Radiation Photophysics; (1993) https://doi.org/10.1117/12.147621
Event: OE/LASE'93: Optics, Electro-Optics, and Laser Applications in Scienceand Engineering, 1993, Los Angeles, CA, United States
Abstract
The results are presented of local interferometry investigation of the microrelief evolution of silicon surface under the high power laser pulsed effect (Ppulse approximately equals 1 J, (lambda) equals 1.06 micrometers , (tau) pulse approximately equals 1.5 msec). It has been shown that the formation of the periodic microrelief is preceded by the excitation and concurrence of surface deformations of various types.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander F. Banishev and I. M. Chistyakov "Investigation of evolution of microprofile on silicon surface under high-power laser-pulsed effect", Proc. SPIE 1856, Laser Radiation Photophysics, (24 June 1993); https://doi.org/10.1117/12.147621
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KEYWORDS
Pulsed laser operation

Silicon

Semiconductor lasers

High power lasers

Laser beam diagnostics

Signal attenuation

Interferometry

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