Paper
15 September 1993 Host-guest effects in the interaction of developers with phenolic resins
Ralph R. Dammel, Mohammad A. Khadim
Author Affiliations +
Abstract
NMR-spectroscopic evidence is presented for a strong interaction between polyphenolates and various onium ion species (i.e., tetramethylammonium, tetramethylphosphonium and trimethylsulfonium salts). In model compounds, a large decrease in solubility leading to precipitation is observed for a mixed Na/TMA+ complex. The formation of onium/phenolate complexes explains such diverse phenomena as the mutual poisoning of metal-ion free and metal ion containing developers, the behavior of developers containing quaternary ammonium surfactants, the anomalous temperature effects observed for tetramethylammonium hydroxide (TMAH) developers, or the dissolution inhibition effect of triarylsulfonium photoacid generators.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ralph R. Dammel and Mohammad A. Khadim "Host-guest effects in the interaction of developers with phenolic resins", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154754
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Photoresist developing

Ions

Photoresist materials

Diffusion

Metals

Silver

Solids

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