Effect of g-line filter transmission characteristics on dose matching between monochromatic exposure tools in a production environment

James R. Przybyla; Tim Emery; Hussein Mukaled

doi:10.1117/12.150475

8 August 1993 Effect of g-line filter transmission characteristics on dose matching between monochromatic exposure tools in a production environment

James R. Przybyla, Tim Emery, Hussein Mukaled

Author Affiliations +

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150475
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

To maintain critical dimension control in a production environment, it is essential that all wafer steppers have their effective doses matched. Because high pressure Mercury illumination sources actually have a bandwidth of 10 nm and typical resist absorbance curves are dropping steeply around the 436 nm region, differences between G-line filters can cause exposure shifts between steppers. Functional exposure differences on dose to clear wafers of 9% are explained by combining integrator and G-line filter spectrophotometer tests on ten .54 NA wafer steppers.

Citation Download Citation

James R. Przybyla, Tim Emery, and Hussein Mukaled "Effect of g-line filter transmission characteristics on dose matching between monochromatic exposure tools in a production environment", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150475

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