Manufacturing parameters of large-batch, small-batch, and single-wafer cluster tools for poly-gate applications

Marinus A. van Driel

doi:10.1117/12.167368

15 February 1994 Manufacturing parameters of large-batch, small-batch, and single-wafer cluster tools for poly-gate applications

Marinus A. van Driel

Author Affiliations +

Proceedings Volume 2091, Microelectronic Processes, Sensors, and Controls; (1994) https://doi.org/10.1117/12.167368
Event: Microelectronic Processing '93, 1993, Monterey, CA, United States

Abstract

In this paper a number of cluster tool concepts will be analyzed to compare numbers such as throughput, cycle time and cost per wafer. This will be done for two of the most frequently used reactor concepts, viz. for single wafer and batch type reactors, and for a number of ambient control concepts. For demonstration purposes, a polysilicon gate process flow will be used, as the process steps involved belong in the class of critical processes in advanced CMOS manufacturing lines.

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Marinus A. van Driel "Manufacturing parameters of large-batch, small-batch, and single-wafer cluster tools for poly-gate applications", Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); https://doi.org/10.1117/12.167368

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