Algorithm for submicron optical metrology optimization with combined illumination techniques

Mircea V. Dusa; Guoqing Xiao; Erik H. Rauch; Joseph C. Pellegrini

doi:10.1117/12.174153

1 May 1994 Algorithm for submicron optical metrology optimization with combined illumination techniques

Mircea V. Dusa, Guoqing Xiao, Erik H. Rauch, Joseph C. Pellegrini

Proceedings Volume 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII; (1994) https://doi.org/10.1117/12.174153
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

Our goal for the CD metrology process is to understand the influence of defocus and illumination latitude upon measured CDs and to optimize the focus and illumination settings for smallest measured CD range. For consistent submicron optical metrology process, the measured CD range should be better than +/- 10 nm (6S). The defocus and illumination latitudes are generated when the features are measured through focus at different illuminations. The process step is the factor that sets the conditions for different illumination modes. Traditional illumination modes in mask metrology are transmitted and reflected. The confocal reflected illumination mode adds a new dimension to the standard reflected light because of the increase in both transversal and longitudinal resolutions. The combined illumination between transmitted and reflected confocal modes proposed here, provide increased feature edge gradient and decreased intensity background noise. To emphasize the effects of the illumination modes, an algorithm is developed for CD metrology optimization using traditional and combined illumination techniques.

Citation Download Citation

Mircea V. Dusa, Guoqing Xiao, Erik H. Rauch, and Joseph C. Pellegrini "Algorithm for submicron optical metrology optimization with combined illumination techniques", Proc. SPIE 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII, (1 May 1994); https://doi.org/10.1117/12.174153

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