CD-SEM metrology using BSE detection

Alon Litman; Asher Pearl; Steven R. Rogers

doi:10.1117/12.174121

1 May 1994 CD-SEM metrology using BSE detection

Alon Litman, Asher Pearl, Steven R. Rogers

Proceedings Volume 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII; (1994) https://doi.org/10.1117/12.174121
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

The characteristics of BSE emission at low beam energies (0.5 to 5 kV) are discussed with reference to signal intensity, topographic contrast, material contrast, charging phenomena, and metrology issues. Experimental results are presented for a back-scattered electron (BSE) detector that has been developed for viewing deep trenches and high-aspect contact holes in the CD-SEM metrology applications.

Citation Download Citation

Alon Litman, Asher Pearl, and Steven R. Rogers "CD-SEM metrology using BSE detection", Proc. SPIE 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII, (1 May 1994); https://doi.org/10.1117/12.174121

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