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1 May 1994 Photochemical batches: E0 modelling and applications
James S. Lekas, James C. Pew, Mark A. Wirzbicki
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Proceedings Volume 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII; (1994) https://doi.org/10.1117/12.174143
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States
Abstract
Experimental investigations into long term process variability at Digital's FAB4 facility indicated batch to batch changes in photochemicals were a significant contributor to process variation. The individual resist and developer batches themselves were within photospeed specifications: however, certain combinations of the two chemicals occasionally resulted in an out of spec condition. A study was undertaken to investigate this phenomenon. The work commenced with an extensive photospeed measurement capability study between the supplier and Digital. Upon completion of the capability work a statistically designed experiment was defined to investigate `system' photospeed. The experiment involved examining the resultant photospeed for all possible combinations of five individual resist and developer batches. Each resist and developer batch was manufactured to a unique photospeed target with values selected to cover and exceed the current photospeed specifications for each of the individual chemicals. The experimental results led to the development of a photochemical batch EO model which defined resultant photospeed as a function of the individual resist/developer batch photospeeds.
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James S. Lekas, James C. Pew, and Mark A. Wirzbicki "Photochemical batches: E0 modelling and applications", Proc. SPIE 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII, (1 May 1994); https://doi.org/10.1117/12.174143
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KEYWORDS
Modeling
Manufacturing
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