Zr-ion bombardment effect on ZrO2/Zircaloy-4 system

Jun Bao; Chunlai Ma; Xinde Bai; Heming Chen; Fen Liu; Yeng Chen

doi:10.1117/12.190762

26 October 1994 Zr-ion bombardment effect on ZrO₂/Zircaloy-4 system

Jun Bao, Chunlai Ma, Xinde Bai, Heming Chen, Fen Liu, Yeng Chen

Proceedings Volume 2364, Second International Conference on Thin Film Physics and Applications; (1994) https://doi.org/10.1117/12.190762
Event: Thin Film Physics and Applications: Second International Conference, 1994, Shanghai, China

Abstract

The ZrO₂/Zircaloy-4 systems before and after Zr⁺ bombardment at low temperature have been studied by use of Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS). It is shown that 100-keV Zr⁺ bombardment of ZrO₂/Zr-4 system at low temperature leads to significant changes of compositional distribution in depth, and meanwhile, results in the alteration of oxide film thickness. Such results may be governed by these factors, such as bombardment conditions, the thickness of ZrO₂ films before bombardment, the amount of surface chemisorption oxygen Oad bombarded into matrix due to collision, and the overlapping extent between oxide film and bombardment damage areas and so on. It is shown that Zr⁺ bombardment enhances oxygen diffusion towards matrix significantly, interface mixing is also observed. XPS is used to determine both compositional and valerice states changes.

Citation Download Citation

Jun Bao, Chunlai Ma, Xinde Bai, Heming Chen, Fen Liu, and Yeng Chen "Zr-ion bombardment effect on ZrO₂/Zircaloy-4 system", Proc. SPIE 2364, Second International Conference on Thin Film Physics and Applications, (26 October 1994); https://doi.org/10.1117/12.190762

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