Paper
19 May 1995 Repair of photo- and x-ray masks by LCVD using nitrogen laser
Elena Fedorovna Reznikova, Vladimir V. Chesnokov, Galina I. Zharkova, Oleg A. Makarov, Vladimir P. Naz'mov, Igor K. Igumenov
Author Affiliations +
Abstract
The use of laser-induced chemical vapor deposition (LCVD) of chromium and rhenium film patterns for reporting of photomask defects and LCVD of rhenium, gold and platinum film pattern for repairing similar defects of X-ray masks was demonstrated. Initial compounds were Cr(CO)6, Re2(CO)10, Me2Au(dpm) and Pt(hfa)2. The high marginal sharpness and the thickness uniformity of deposited films was provided by the use of powerful nanosecond pulse laser, the protective system for a delineation of a irradiation zone and the laser beam microscanning in limits of this zone. The scheme of the set for the direct laser deposition of film micropatterns was presented.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Elena Fedorovna Reznikova, Vladimir V. Chesnokov, Galina I. Zharkova, Oleg A. Makarov, Vladimir P. Naz'mov, and Igor K. Igumenov "Repair of photo- and x-ray masks by LCVD using nitrogen laser", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209184
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KEYWORDS
Gold

Platinum

X-rays

Photomasks

Metals

Chromium

Rhenium

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